20 Fri.

Room A
FA-1: 3D-3

9:00-10:40 FA1-1 [Session Invited]
Necessity of Chip on Chip Technology for 3D IC
Hiroshi Ozaki (Sony Corporation, Japan)
FA1-2 Encapsulation Technology by Silicon Based Cavity with TSV Electrode for Pseudo-SoC Application
Toshihiko Nagano, Kazuhide Abe, Hiroshi Yamada and Kazuhiko Itaya (Toshiba Corporation, Japan)
FA1-3 Wafer-level Over Molding Process Development for a stacked WCSP Package with Through Silicon Vias (TSVs)
Yoshimi Takahashi, Rajiv Dunne, Yohei Koto, Shoichi Iriguchi, Masazumi Amagai, Tom Bonifield, Philipp Steinmann and David Stepniak (Texas Instruments Inc., USA)
FA1-4 Development of Si interposer for 2.5D advanced package
Satoru Kuramochi1 and Yoshitaka Fukuoka2 (1Dai Nippon Printing Co., Ltd., and 2Weisti, Japan)


FA-2: Korea Session-1

10:50-12:30 FA2-1 Wetting characteristics of Cu-xZn layers for Sn-3.0Ag-0.5Cu solders
Ji Hyun Lee, Young Min Kim and Young-ho Kim (Hanyang University, Korea)
FA2-2 Cost Effective Coreless Process for Thinner Substrate
Hwa Dong Oh, Young Joo Ko and Sang Hee Kim (Daeduck Electronics, Korea)
FA2-3 A Novel High-Efficient Aligning Structure for Optical PCB Interconnection
Dong Min Kim, Tae Kyung Lee, Tae Ho Lee and Myung Yung Jeong (Pusan National University, Korea)
FA2-3 The Effects of Levelers on 3D SiP Copper Via Filling
Myung-Won Jung, Ki-Tae Kim and Jae-Ho Lee (Hongik University, Korea)


FA-3: Korea Session-2

13:30-15:35 FA3-1 Characteristics of Heat Dissipation and Light Output Power of High-Power LED Packages Processed with Various Thermal Via Technologies
Min-Young Kim1, Byung-Kyu Yu1, Tak Jeong2, Jun-Seok Ha 3 and Tae-Sung Oh1 (1Department of Materials Science and Engineering, Hongik University, 2Korea Photonics Technology Institute and 3Faculty of Applied Chemical Engineering, Chonnam National University, Korea)
FA3-2 Electrical Properties of Polymer Solar Cells with PCDTBT:PCBM Active Layer
Kun Ho Kim1, Seung Ho Kim1, Young Chul Chang2 and Ho Jung Chang1 (1Dankook University and 2Korea University of Technology and Education, Korea)
FA3-3 Underfill Thermal and Mechanical Study with Filler Variation
Woong-Sun Lee 1, Jin Yu2 and Kwang-Yoo Byun1 (1Hynix Semiconductor Inc. and 2KAIST, Korea)
FA3-4 Abrasion Resistance of Nano Crystal Ni Plated on Mold Cavity
Yongbin Sun (Kyonggi University, Korea)
FA3-5  Cancelled


FA4: Interconnection-3

15:40-17:20 FA4-1 Adhesion test for underfill delamination in flip chip package
Keishi Okamoto, Akihiro Horibe and Kazushige Toriyama (IBM Japan, Ltd., Japan)
FA4-2 Mode Counting System for Die Pull Test
Yoshiyuki Arai, Yoshinori Miyamoto, Shinpei Aoki and Kenji Shimatan (Toray engineering Co., Ltd., Japan)
FA4-3 Improvement of Low-k Delamination with Substrate Pad Structure for Lead-Free Package
Makoto Okada, Michihiko Ichinose and Kouji Kimbara (Renesas Electronics Corporation, Japan)
TA4-4 An Acceleration Model with Thermal Cycle Profile for Pb-free Solder Joint Reliability
Akifumi Yoshimua and Keishi Okamoto(IBM Japan, japan)
FA4-5 A Unique Low-Ag Alloy Solder Paste for High-Reliability SMT Applications
Masato Shimamura (Senju Metal Industry Co., Ltd., Japan)


Room B
FB1: Advanced-1

9:00-10:40 FB1-1 [Session Invited] (50min.)
Development of High-end CPU Packaging for Supercomputer
Masateru Koide (Fujitsu Advanced Technologies Limited, Japan)
FB1-2 Wafer level packaging to address future direct chip attach needs
Yoshihiro Tomita 1, Yoko Sekihara1, Jiro Kubota1, Kinya Ichikawa1 and Bob Sankman2 (1Intel K.K., Japan and 2Intel Corp., USA)
FB1-3 Analysis on Design and Mechanical Stress of 2.5D Package Interposers
Takashi Hisada, Toyohiro Aoki, Junko Asai and Yasuharu Yamada (IBM Japan, Ltd., Japan)


FB2: Advanced-2

10:50-12:30 FB2-1 Low Cost fcCSP Based on Cu Pillar
Bernd Karl Appelt1, Harrison Chung 2, Chienfan Chen2, Raymond Wang2 and Mike Hung2 (1ASE Group, USA and 2ASE Group, Taiwan)
FB2-2 Thin SiP and 3D eWLB (embedded Wafer Level BGA) Technology for Advanced Packaging
S.W. Yoon, Yaojian Lin and Pandi C. Marimuthu (STATS ChipPAC Ltd., Singapore)
FB2-3 Novel EMI Shielding Methodology on SiP Module
Kuo-Hsien Liao1, Alex Chi-Hong Chan1, Bradford J. Factor2 (1ASE Group, Taiwan and 2ASE Europe, Belgium)
FB2-4 A multi-die DRAM Package for Solder-down Memory in UltraBook and Tablet PC Applications
Richard D. Crisp1, Wael Zohni1, Bel Haba2, G. Pelissier3 and V. Bui3 (1Invensas Corporation 2Tessera Intellectual Property Corp., USA and 3Dell Inc., Taiwan)


FB3: Advanced-3

13:30-15:10 FB3-1 [Session Invited]
Key Packaging Technologies Progressing Fast This Year
Hirofumi Nakajima (Renesas Electronics Corporation, Japan)
FB3-2 Formic Gas Used Cu Surface Treatment and Low Temperature Direct Bonding
Wenhua Yang, Masatake Akaike and Tadatomo Suga (The University of Tokyo, Japan)
FB3-3 Impact of the oxidation process on copper leadframe surface causing delamination between copper and mold compound interface
Chin Yung Lai (Infineon Technologies Sdn Bhd, Malysia) Cancelled
FB3-4 Copper Wire Bonding Is a Viable Interconnection Method
Bernd Karl Appelt1, Andy Tseng1, Louie Huang2, Scott Chen2 (1ASE Group, USA and 2ASE Group, Taiwan)


FB4: Substrate

15:40-17:20 FB4-1 Challenges to Increasing Wiring Density for Organic Packaging Substrates
Masahiro Tsuriya, Haley Fu and Jim Amold (iNEMI (International Electronics Manufacturing Initiative), USA)
FB4-2 Interposer-embedded packaging technology, a feasible solution for a thinner form-factor
Ren-Shin Cheng, Yu-Wei Huang, Yin-P0 Hung, Fang-Jun Leu, Pei-Cheng Chang, Tao-Chih Chang and Tai-Hong Chen (ITRI, Taiwan)
FB4-3 Advanced Low CTE Organic Package Material for Chip Scale Packaging
Masahiro Fukui1, Tomoyuki Yamada1, Kenji Terada1, Yoshihiro Hosoi1, Masaaki Harazono1, Teruya Fijisaki1, Francesco Preda2, Jean Audet2, Sushumna Iruvanti2, Shidong Li2, Scott Moore2, Charles Reynolds2 (1KYOCERA SLC Technologies Corporation, Japan and 2 International Business Machines Corporation, USA)
FB4-4 Warpage Resolution for Ball Grid Array (BGA) Package in a Fully Integrated Assembly
Alvin Binza Denoyo (Cypress Manufacturing Limited, Philippines)
FB4-5 Adhesion Characteristics of Magnetron-Sputter Deposited Copper on Smooth Cycloolefin for Realizing High-Performance Printed Wiring Board
Tetsuya Goto1, T. Matsuo2, M. Iwaki1, K. Soeda1, R. Hiratsuka1, S. Sugawa1 and T. Ohmi1 (1Tohoku University and 2ZEON Corporation, Japan )


Room C
FC1: Interconnection-2

9:00-10:40 FC1-1 [Session Invited] (50min.)
Achieving Fine Geometry Through Embedded Fabrication & Assembly
Chuck E. Bauer (TechLead, USA)
FC1-2 Interfacial phenomena in barrier layer SiCN / Cu film related to adhesion
Satoko ABE, Teruhisa BABA, Kenichi UEOKA, Kouji YONEDA and Jiping YE (NISSAN ARC, LTD., Japan)
FC1-3 Effect of the crystallinity of electroplated copper thin films on their mechanical and electrical reliability
Naokazu Murata, N. Saito, K. Suzuki and H. Miura (Tohoku University, Japan)


FC2: MFG-3

10:50-12:30 FC2-1 Wire Sweep Analysis for Copper Wire and Pd-coated Copper Wires in Semiconductor Wirebonding Technology
Huang-Kuang Kung1, Hung-Shyong Chen 1, Ming-Cheng Lu1, Che-Chang Li1, Hong-Meng Ho2 (1Cheng Shiu University, Taiwan and 2Semicon Fine Wire Pte Ltd, Singapore)
FC2-2 Flip-chip Interconnection by Pre-applied Under-fill Material using Copper Pillar Bumps
Koji Motomura, Hiroki Maruo, Hideki Eifuku and Tadahiko Saka (Panasonic Factory Solutions Co., Ltd., Japan)
FC2-3 B-stageable no-flow underfill for fine pitch die to substrate packages
Kenichi Tosaka (Namics corporation, Japan)
FC2-4 Flux Residue Cleaning Process Optimization for Flip Chip Ball Grid Array (FCBGA)
Noor Azrina Talik1, C.S Foong2, B.K Yap1 and C.Y Ta1(1Univeriti Tenaga Nasional and 2Fresscale Semiconductor Malaysia SDN BH, Malaysia )


FC3: Thermal-2

13:30-15:10 FC3-1 Industrial Need for Accurate and Reproducible Measurements of Thermal Interface Materials
Andras Vass-Varnai1,2, Zoltan Sarkany1,2, Gabor Farkas2 and Marta Rencz1,2 (1Budapest University of Technology and Economics and 2Mentor Graphics, Hungary)
FC3-2 Developing Preferential Heat Flow Path in Metal Matrix Composite
Makoto Kobashi and Naoyuki Kanetake (Nagoya University, Japan)
FC3-3 Steady and Transient Thermal Simulation of GaN Devices for High-Speed Switching Applications
Satoshi Ono1, Shigeru Hiura1, Mauro Ciappa2 and Wolfgang Fichtner2 (1Toshiba Corporation, Japan and 2Swiss Federal Institute of Technology, Switzerland)
FC3-4 Development and analysis of the thermoelectric material with intermetallic compound
Li-Ling Liao1,2, Ming-Ji Dai1, Chun-Kai Liu1, Jing-Yao Chang1 and Kuo-Ning Chiang2,3 (1ITRI, 2National Tsing Hua University and 3National Center for High-Performance Computing, Taiwan)


FC4: Thermal-3

15:40-17:20 FC4-1 Transient Heat Conduction Simulation of the Microprocessor - Investigation regarding Thermal Control with Power Limiting
Koji Nishi (AMD Japan Ltd., Japan)
FC4-2 TUse Isothermal Surface to help understanding the Spatial Representation of Structure Function
Yafei Luo (Mentor Graphics Japan, Japan)
FC4-3 The Development of aHSBGA
Simon Wang1, Scott Chen1, Coltrane Lee 1, Robin Cheng1, TS Chen1 and Andy Tseng2 (1ASECL, Inc., Taiwan and 2ASE US, USA)
FC4-4 A Method of High Accuracy Prediction of Θjb and Θjc from Θja through Thermal Network Analysis
Kenichi Inaba and M. Yoshikawa (NEC Corporation, Japan)


Room D
FD1: DMR-3

9:00-10:40 FD1-1 Reliability Study of Thick-film Pressure Sensor on Steel Substrate
Zongyang Zhang1,2 and Sheng Liu1,2 (1Huazhong University of Science & Technology and 2Wuhan National Laboratory for Optelectronics, China)
FD1-2 A Thermal Model for Non-linear Distortion in Printed Circuit Lines for Condition Monitoring of Electronics
Michael Krueger1, Andreas Middendorf 1, Nils F. Nissen2, Herbert Reichl1 and Klaus-Dieter Lang1 (1Technische Universitaet Berlin and 2Fraunhofer IZM, Germany)
FD1-3 An Analysis of Failure of Microelectronic Packaging due to Conductive Anodic Filament Formation
Jan-Rong Yang and Mei-Ling Wu (National Sun Yat-Sen University, Taiwan)


FD2: DMR-4

9:00-10:40 FD2-1 Innovative 4Layer CPU Package Design to Enable Low Cost Platform Solution
Chan Kim LEE, Chin Lee KUAN and Howe Yin LOO (Intel Microelectronics (M) Sdn. Bhd., Malaysia)
FD2-2 Walkthrough on Package Design Challenges, Optimization and Technical Resolutions
Howe Yin LOO (Intel Microelectronics (M) Sdn. Bhd., Malaysia) Cancelled
FD2-3 An Innovative Motherboard Concept to Enable Low Cost Package Decoupling Solution
Howe Yin LOO and Chan Kim LEE (Intel Microelectronics (M) Sdn. Bhd., Malaysia)
FD2-4 A New Proposal for Representing the Process of Electronics Packaging Using DSM
Keiichi Ohizumi and Atsushi Maeda (O2, Japan)


FD3: DMR-5

13:30-15:10 FD3-1 On-die PDN Response Observation of a 6.4Gbps SerDes Device by Direct Excitation from an External Signal Source and the System-Level PDN Modeling
Masahiro Toyama, Ryuichi Oikawa, Motoo Suwa and Atsushi Nakamura (Renesas Electronics Corporation, Japan)
FD3-2 Characterization of Electromagnetic Noise Coupling in DC-DC Converter Module
Keisuke Sawada, Masaya Tanaka, Shuji Sagara and Tatsuya Ikeuchi (Dai Nippon Printing Co., Ltd., Japan)
FD3-3 Icc(t) Modeling Methodology for High-Speed DDR Power Integrity Design
Heng Chuan Shu and Fern Nee Tan (Intel Microelectronics (M) Sdn Bhd, Malysia)
FD3-4 Does Power Rail Merger work for High Speed I/O interfaces like PCIe, SATA and USB?
Fern Nee Tan (Intel Microelectronics (M) Sdn Bhd, Japan)


FD4: DMR-6

15:40-17:20 FD4-1 Evaluation of 6.4 Gbps Single-ended Interface through a Standard DIMM Connector
Keisuke Saito and Arun Vaidyanath (Rambus, Inc., USA)
FD4-2 Design and Analysis of Power Delivery Network in an SoC: A Review
Li Wern Che (Intel Microelectonics (M) Sdn. Bhd., Malaysia)
FD4-3 A Novel High-Frequency Analysis and Modeling for Printed-Circuit Boards Using the Enhanced Optimized Segment Extraction Method with Multi-Port S-Parameter
Hirobumi Inoue1 and Kazuhiko Honjo2 (1NEC System Jisso Technologies Research Laboratories and 2The University of Electro-Communications, Japan)
FD4-4 Extension of EOSE Method to Weak Nonlinear Systems and Its Application to InGaP/GaAs HBT MMIC Parallel Tracks
Hirobumi Inoue1, Ryo Ihikawa2 and Kazuhiko Honjo2 (1NEC System Jisso Technologies Research Laboratorie and 2The University of Electro-Communications, Japan)
FD4-5 Measurement and Simulation of Transmission Characteristic for Interconnect Structure Using 30μm Pitch Microbump Array on Coplanar Waveguide
Yotaro Yasu1,2, Katsuya Kikuchi2, Fumiki Kato2, Shunsuke Nemoto2, Hiroshi Nakagawa2, Kohji Koshiji1 and Masahiro Aoyagi1,2 (1Graduated School Tokyo University of Science and 2AIST)